Coating Technology
Coating Technology
HT OPTICS’ patent parent company-HTNM is a cutting-edge technology company providing customers with advanced products using new materials including sapphire and AlN etc., for applications in optics, functional thin films, radio frequency (RF) filters, fiber optics components, bio-sensors, and piezoelectric sensors.
HTNM is a supplier of high precision optical thin film products with independently developed thin film deposition ARS (Atomic Reactive Sputtering) technology. A patent for this innovative technology was awarded to HTNM in 2015. This technology enables HTNM to manufacture a large variety of high performance thin film products including AR Coatings, Band passs filters, DLC etc.
Technology Advantages:
1) Patented thin film technology ARS (Atomic Reactive Sputtering) (Chinese patent# 201310082514.1)
2) Proprietary optical monitoring design for stable,real-time in-situ monitoring of optical properties and thickness on wafer
3) Proprietary wafer carrier design for deposition of ≥9 wafers per coating run
4) Has the most PVD technologies available: thermal evaporation, E-Beam, IAD, sputtering
5) Has a variety of coating chamber sizes and quick turn-around: 800mm to 1300mm
6) Proprietary large cathode design for stable high rate sputtering
7) Proprietary large cathode design for high temperature process: >800°C
8) Proprietary vacuum chamber design for processes requiring substrate temperatures > 800°C
9) Proprietary design and setup to minimize contamination on the wafer during deposition
10) Proprietary chamber design to separate the deposition and reaction regions to ensure stable flow and pump speed
Integrated Service Advantages:
1) We offer a large variety of thin film products:
l AR(Anti-Refection)
l HR(High Reflection)
l BS(Beam Splitter)
l EF(Edge Filter)
l BP(Band Pass Filter)
l Metallic Coatings
l AS/AF(Anti Fingerprint)
2) Thin film products cover UV to NIR (190nm to 3um)
3) Extreme hard coatings with ARS process, high LIDT coatings
4) We are experts on narrow band pass filters: Optical Filters, High cavity filters, 3D camera filters, fluorescent filters
5) Custom designed coatings and fast prototyping
6) Modern metrology equipment: ZYGO, KLA, Cary…
Cutting edge lapping/polishing lines for glass, sapphire and ceramic
Thin Film Coating Capabilities:
Electron Beam/Thermal Source Evaporation:
Electron Beam/Thermal Source Evaporation | ||
Specification |
Typical Tolerance |
Best Tolerance |
Random Physical Thickness Errors | <2.0%<> | <1.0%<> |
Random Optical Thickness Errors | <1.0%<> | <0.5%<> |
Run-to-run centering | ± 1.5% | ± 0.5% |
Planetary uniformity | <1.0%<> | <0.25%<> |
Wet/dry shift (range) | 0.5-1.5% | 0.5-1.5% |
(HR,1064nm, 10ns, 10Hz) Laser damage threshold (HR, 1064nm, 10ns, 10Hz) | >15 J/cm2 | >30 J/cm2 |
Absorption | <0.1%<> | <0.1%<> |
Scatter | <0.1%<> | <0.1%<> |
Surface roughness | 20 Å rms typical | 10 Å rms typical |
Ion Assisted Deposition (IAD)
Ion Assisted Deposition (IAD) | ||
Specification |
Typical Tolerance |
Best Tolerance |
Random Physical Thickness Errors | <2.0%<> | <1.0%<> |
Random Optical Thickness Errors | <1.0%<> | <0.5%<> |
Run-to-run centering | ± 1.5% | ± 0.5% |
Planetary uniformity | <1%<> | <0.25%> |
Wet/dry shift (range) | 0.5-1% | 0.5-1% |
(HR,1064nm, 10ns, 10Hz) Laser damage threshold (HR, 1064nm, 10ns, 10Hz) | >10 J/cm2 | >15 J/cm2 |
Absorption | <0.1%<> | <0.1%<> |
Scatter | <0.1%<> | <0.1%<> |
Surface roughness | 20 Å rms typical | 10 Å rms typical |
Atomic Reactive Sputtering (ARS)
Atomic Reactive Sputtering (ARS) | ||
Specification |
Typical Tolerance |
Best Tolerance |
Random Thickness Errors | <0.<>7% | <0.25%<> |
Run-to-run centering | ± 0.5% | ± 0.25% |
Planetary uniformity | <1%<> | <0.25%> |
Wet/dry shift (range) | 0% | 0% |
(HR,1064nm, 10ns, 10Hz) Laser damage threshold (HR, 1064nm, 10ns, 10Hz) | >1 J/cm2 | >1 J/cm2 |
Absorption | ~ 100 PPM (0.01%) | ~50 PPM |
Scatter | ~ 100 PPM (0.01%) | ~50 PPM |
Surface roughness | 10 Å rms typical | 5 Å rms typical |
Coating Test Capabilities:
Cary Spectrophotometer | ||
Test |
Typical Range |
Tolerance |
Transmission scan, normal incidence | 0.190-3.0 mm | ± 0.05% @ absorbance =0.5 |
Reflection scan, normal incidence | 0.190-3.0 mm Commercial Reflectance Tool
HT’s Reflectance Tool
AR Reflectance Scan |
± 1.0%
±0.50%
±0.05% |
Transmission scan, oblique incidence | 0.190-3.0 mm 0-90 deg. variable angle fixture P, S, UNP polarizations | ± 0.05% @ absorbance =0.5 |
Reflection scan, oblique incidence | 0.190-3.0 mm, 45° fixture Commercial Reflectance Tool
HT’s Reflectance Tool
AR Reflectance Scan P, S, UNP polarizations |
± 1.0%
±0.25%
±0.05% |
Humidity Chamber | |
Test |
Typical Range |
Mil. Spec. Temp. Test |
-70 to +150 °C (-94 to 302 °F) |
Mil Spec Humidity Test |
10%-95%RH |
Coating Hardness Tester | |
Test | Typical Range |
Mil Spec. Coating Hardness Test
| Adhesion (Tape) Mild Abrasion (cheesecloth) Severe Abrasion (eraser) |
Laser Testing | |
Test |
Typical Range/Tolerance |
633 nm HeNe Laser |
Output power = 100 mW-5 mW |
Tunable Laser |
l=1510-1590 nm |
Laser Damage Threshold (LDT) |
l=193 nm to 10.6 mm (Independent lab test) |
Interferometer | |
Test |
Typical Accuracy (limit) |
Zygo High Resolution GPI-XP (l = 633 nm) l 4” to 6 mm reducer with l/20 wave ref. flat l F/0.75, F/1.5, F/3.4, F/7.6 and F/10.6 transmission spheres (4” dia.) |
Surface flatness:
10-152 mm dia.: l/40 (low limit) |
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